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Applicability of HF solutions for contact hole cleaning on top of TiSi2

dc.contributor.authorBaklanov, Mikhaïl
dc.contributor.authorKondoh, Eiichi
dc.contributor.authorVanhaelemeersch, Serge
dc.contributor.authorMaex, Karen
dc.date.accessioned2021-09-30T11:25:48Z
dc.date.available2021-09-30T11:25:48Z
dc.date.issued1998
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/2363
dc.sourceIIOimport
dc.titleApplicability of HF solutions for contact hole cleaning on top of TiSi2
dc.typeProceedings paper
dc.contributor.imecauthorVanhaelemeersch, Serge
dc.contributor.imecauthorMaex, Karen
dc.contributor.orcidimecVanhaelemeersch, Serge::0000-0003-2102-7395
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage602
dc.source.endpage609
dc.source.conferenceProceedings of the 5th International Symposium on Cleaning Technology in Semiconductor Device Manufacturing
dc.source.conferencedate31/08/1997
dc.source.conferencelocationParis France
imec.availabilityPublished - open access
imec.internalnotesElectrochemical Society Proceedings; Vol. 97-35


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