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Impact of stochastic effects on EUV printability limits

dc.contributor.authorDe Bisschop, Peter
dc.contributor.authorVan de Kerkhove, Jeroen
dc.contributor.authorMailfert, Julien
dc.contributor.authorVaglio Pret, Alessandro
dc.contributor.authorBiafore, John
dc.date.accessioned2021-10-22T01:05:24Z
dc.date.available2021-10-22T01:05:24Z
dc.date.issued2014
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/23700
dc.sourceIIOimport
dc.titleImpact of stochastic effects on EUV printability limits
dc.typeProceedings paper
dc.contributor.imecauthorDe Bisschop, Peter
dc.contributor.imecauthorVan de Kerkhove, Jeroen
dc.contributor.imecauthorMailfert, Julien
dc.contributor.imecauthorVaglio Pret, Alessandro
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage904809
dc.source.conferenceExtreme Ultraviolet (EUV) Lithography V
dc.source.conferencedate23/02/2014
dc.source.conferencelocationSan Jose, CA USA
dc.identifier.urlhttp://proceedings.spiedigitallibrary.org/proceeding.aspx?articleid=1863968
imec.availabilityPublished - open access
imec.internalnotesProceedings of SPIE; Vol. 9048


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