dc.contributor.author | De Schepper, Peter | |
dc.contributor.author | Altamirano Sanchez, Efrain | |
dc.contributor.author | Goodyear, Andy | |
dc.contributor.author | El Otell, Ziad | |
dc.contributor.author | de Marneffe, Jean-Francois | |
dc.contributor.author | De Gendt, Stefan | |
dc.date.accessioned | 2021-10-22T01:08:24Z | |
dc.date.available | 2021-10-22T01:08:24Z | |
dc.date.issued | 2014 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/23718 | |
dc.source | IIOimport | |
dc.title | Photoresist treatment using an ICP H2 plasma and low ESC temperature: LWR study | |
dc.type | Proceedings paper | |
dc.contributor.imecauthor | De Schepper, Peter | |
dc.contributor.imecauthor | Altamirano Sanchez, Efrain | |
dc.contributor.imecauthor | El Otell, Ziad | |
dc.contributor.imecauthor | de Marneffe, Jean-Francois | |
dc.contributor.imecauthor | De Gendt, Stefan | |
dc.contributor.orcidimec | De Gendt, Stefan::0000-0003-3775-3578 | |
dc.source.peerreview | no | |
dc.source.conference | 1st Single nanometer Manufacturing Workshop | |
dc.source.conferencedate | 2/07/2014 | |
dc.source.conferencelocation | Barcelona Spain | |
imec.availability | Published - imec | |