dc.contributor.author | De Schepper, Peter | |
dc.contributor.author | El Otell, Ziad | |
dc.contributor.author | de Marneffe, Jean-Francois | |
dc.contributor.author | Altamirano Sanchez, Efrain | |
dc.contributor.author | De Gendt, Stefan | |
dc.date.accessioned | 2021-10-22T01:08:43Z | |
dc.date.available | 2021-10-22T01:08:43Z | |
dc.date.issued | 2014 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/23720 | |
dc.source | IIOimport | |
dc.title | The influence of hydrogen plasma treatment on LWR mitigation: The importance of EUV photoresist composition | |
dc.type | Meeting abstract | |
dc.contributor.imecauthor | De Schepper, Peter | |
dc.contributor.imecauthor | El Otell, Ziad | |
dc.contributor.imecauthor | de Marneffe, Jean-Francois | |
dc.contributor.imecauthor | Altamirano Sanchez, Efrain | |
dc.contributor.imecauthor | De Gendt, Stefan | |
dc.contributor.orcidimec | De Gendt, Stefan::0000-0003-3775-3578 | |
dc.source.peerreview | no | |
dc.source.conference | Micro and Nano Engineering 2014 | |
dc.source.conferencedate | 22/09/2014 | |
dc.source.conferencelocation | Lausanne Switzerland | |
imec.availability | Published - imec | |