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Surface chemistry of deposition processes for epitaxial Si-O superlattices

dc.contributor.authorDelabie, Annelies
dc.contributor.authorJayachandran, Suseendran
dc.contributor.authorBillen, Arne
dc.contributor.authorDouhard, Bastien
dc.contributor.authorConard, Thierry
dc.contributor.authorMeersschaut, Johan
dc.contributor.authorBender, Hugo
dc.contributor.authorDemeulemeester, Jelle
dc.contributor.authorVandervorst, Wilfried
dc.contributor.authorCaymax, Matty
dc.contributor.authorHeyns, Marc
dc.date.accessioned2021-10-22T01:12:54Z
dc.date.available2021-10-22T01:12:54Z
dc.date.issued2014
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/23743
dc.sourceIIOimport
dc.titleSurface chemistry of deposition processes for epitaxial Si-O superlattices
dc.typeMeeting abstract
dc.contributor.imecauthorDelabie, Annelies
dc.contributor.imecauthorJayachandran, Suseendran
dc.contributor.imecauthorDouhard, Bastien
dc.contributor.imecauthorConard, Thierry
dc.contributor.imecauthorMeersschaut, Johan
dc.contributor.imecauthorBender, Hugo
dc.contributor.imecauthorVandervorst, Wilfried
dc.contributor.imecauthorCaymax, Matty
dc.contributor.imecauthorHeyns, Marc
dc.contributor.orcidimecConard, Thierry::0000-0002-4298-5851
dc.contributor.orcidimecMeersschaut, Johan::0000-0003-2467-1784
dc.source.peerreviewyes
dc.source.beginpage122
dc.source.conference14th International Conference on Atomic Layer Deposition - ALD
dc.source.conferencedate15/06/2014
dc.source.conferencelocationKyoto Japan
dc.identifier.urlhttp://www.ald2014.org/pdf/ALD2014Program_V4.pdf
imec.availabilityPublished - imec


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