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Development of a novel wafer probe for in-situ measurements

dc.contributor.authorEl Otell, Ziad
dc.contributor.authorMarinov, Daniil
dc.contributor.authorSamra, Vladimir
dc.contributor.authorBowden, Mark
dc.contributor.authorde Marneffe, Jean-Francois
dc.contributor.authorVerdonck, Patrick
dc.contributor.authorBraithwaite, Nicholas
dc.date.accessioned2021-10-22T01:22:32Z
dc.date.available2021-10-22T01:22:32Z
dc.date.issued2014
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/23790
dc.sourceIIOimport
dc.titleDevelopment of a novel wafer probe for in-situ measurements
dc.typeMeeting abstract
dc.contributor.imecauthorEl Otell, Ziad
dc.contributor.imecauthorde Marneffe, Jean-Francois
dc.contributor.imecauthorVerdonck, Patrick
dc.contributor.orcidimecVerdonck, Patrick::0000-0003-2454-0602
dc.source.peerreviewno
dc.source.conferencePlasma Etch and Strip in Microelectronics Workshop - PESM
dc.source.conferencedate12/05/2014
dc.source.conferencelocationGrenoble France
imec.availabilityPublished - imec


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