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Tailored Si-layers on silicon oxide obtained by thermal CVD

dc.contributor.authorBeaucarne, Guy
dc.contributor.authorPoortmans, Jef
dc.contributor.authorCaymax, Matty
dc.contributor.authorNijs, Johan
dc.contributor.authorMertens, Robert
dc.date.accessioned2021-09-30T11:26:51Z
dc.date.available2021-09-30T11:26:51Z
dc.date.issued1998
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/2379
dc.sourceIIOimport
dc.titleTailored Si-layers on silicon oxide obtained by thermal CVD
dc.typeProceedings paper
dc.contributor.imecauthorPoortmans, Jef
dc.contributor.imecauthorCaymax, Matty
dc.contributor.imecauthorMertens, Robert
dc.contributor.orcidimecPoortmans, Jef::0000-0003-2077-2545
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage89
dc.source.endpage94
dc.source.conferenceThin-Film Structures for Photovoltaics
dc.source.conferencedate2/12/1997
dc.source.conferencelocationBoston, MA USA
imec.availabilityPublished - open access
imec.internalnotesMRS Symposium Proceedings; Vol. 485


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