Show simple item record

Hf-based high-k dielectrics for p-Ge MOS gate stacks

dc.contributor.authorFadida, Sivan
dc.contributor.authorPalumbo, Felix
dc.contributor.authorNyns, Laura
dc.contributor.authorLin, Dennis
dc.contributor.authorVan Elshocht, Sven
dc.contributor.authorCaymax, Matty
dc.contributor.authorEizenberg, Moshe
dc.date.accessioned2021-10-22T01:24:41Z
dc.date.available2021-10-22T01:24:41Z
dc.date.issued2014
dc.identifier.issn1071-1023
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/23800
dc.sourceIIOimport
dc.titleHf-based high-k dielectrics for p-Ge MOS gate stacks
dc.typeJournal article
dc.contributor.imecauthorNyns, Laura
dc.contributor.imecauthorLin, Dennis
dc.contributor.imecauthorVan Elshocht, Sven
dc.contributor.imecauthorCaymax, Matty
dc.contributor.orcidimecNyns, Laura::0000-0001-8220-870X
dc.contributor.orcidimecVan Elshocht, Sven::0000-0002-6512-1909
dc.source.peerreviewyes
dc.source.beginpage03D105
dc.source.journalJournal of Vacuum Science and Technology B
dc.source.issue3
dc.source.volume32
dc.identifier.urlhttp://scitation.aip.org/content/avs/journal/jvstb/32/3/10.1116/1.4837295
imec.availabilityPublished - imec


Files in this item

FilesSizeFormatView

There are no files associated with this item.

This item appears in the following collection(s)

Show simple item record