Hf-based high-k dielectrics for p-Ge MOS gate stacks

Metadata

Show full item record

Authors

Fadida, Sivan; Palumbo, Felix; Nyns, Laura; Lin, Dennis; Van Elshocht, Sven; Caymax, Matty; Eizenberg, Moshe

ISSN

1071-1023

Issue

3

Journal

Journal of Vacuum Science and Technology B

Volume

32

Title

Hf-based high-k dielectrics for p-Ge MOS gate stacks

Publication type

Journal article

Collections

Articles