Publication:
Hf-based high-k dielectrics for p-Ge MOS gate stacks
Date
| dc.contributor.author | Fadida, Sivan | |
| dc.contributor.author | Palumbo, Felix | |
| dc.contributor.author | Nyns, Laura | |
| dc.contributor.author | Lin, Dennis | |
| dc.contributor.author | Van Elshocht, Sven | |
| dc.contributor.author | Caymax, Matty | |
| dc.contributor.author | Eizenberg, Moshe | |
| dc.contributor.imecauthor | Nyns, Laura | |
| dc.contributor.imecauthor | Lin, Dennis | |
| dc.contributor.imecauthor | Van Elshocht, Sven | |
| dc.contributor.imecauthor | Caymax, Matty | |
| dc.contributor.orcidimec | Nyns, Laura::0000-0001-8220-870X | |
| dc.contributor.orcidimec | Van Elshocht, Sven::0000-0002-6512-1909 | |
| dc.date.accessioned | 2021-10-22T01:24:41Z | |
| dc.date.available | 2021-10-22T01:24:41Z | |
| dc.date.issued | 2014 | |
| dc.identifier.issn | 1071-1023 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/23800 | |
| dc.identifier.url | http://scitation.aip.org/content/avs/journal/jvstb/32/3/10.1116/1.4837295 | |
| dc.source.beginpage | 03D105 | |
| dc.source.issue | 3 | |
| dc.source.journal | Journal of Vacuum Science and Technology B | |
| dc.source.volume | 32 | |
| dc.title | Hf-based high-k dielectrics for p-Ge MOS gate stacks | |
| dc.type | Journal article | |
| dspace.entity.type | Publication | |
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