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A compact physical CD-SEM simulator for IC photolithography modeling applications

dc.contributor.authorFang, Chao
dc.contributor.authorSmith, Mark D
dc.contributor.authorVaglio Pret, Alessandro
dc.contributor.authorBiafore, John
dc.contributor.authorRobertson, Steward A
dc.contributor.authorBekaert, Joost
dc.date.accessioned2021-10-22T01:25:09Z
dc.date.available2021-10-22T01:25:09Z
dc.date.issued2014
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/23802
dc.sourceIIOimport
dc.titleA compact physical CD-SEM simulator for IC photolithography modeling applications
dc.typeProceedings paper
dc.contributor.imecauthorVaglio Pret, Alessandro
dc.contributor.imecauthorBekaert, Joost
dc.contributor.orcidimecBekaert, Joost::0000-0003-3075-3479
dc.source.peerreviewyes
dc.source.beginpage923618
dc.source.conferenceScanning Microscopies 2014
dc.source.conferencedate16/09/2014
dc.source.conferencelocationMonterey, CA USA
dc.identifier.urlhttp://proceedings.spiedigitallibrary.org/proceeding.aspx?articleid=1906647
imec.availabilityPublished - imec
imec.internalnotesProceedings of SPIE; Vol. 9236


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