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Engineering of Hf1-xAlxOy amorphous dielectrics for high-performance RRAM applications

dc.contributor.authorFantini, Andrea
dc.contributor.authorGoux, Ludovic
dc.contributor.authorClima, Sergiu
dc.contributor.authorDegraeve, Robin
dc.contributor.authorRedolfi, Augusto
dc.contributor.authorAdelmann, Christoph
dc.contributor.authorPolimeni, Giuseppe
dc.contributor.authorChen, Yangyin
dc.contributor.authorKomura, Masanori
dc.contributor.authorBelmonte, Attilio
dc.contributor.authorWouters, Dirk
dc.contributor.authorJurczak, Gosia
dc.date.accessioned2021-10-22T01:26:02Z
dc.date.available2021-10-22T01:26:02Z
dc.date.issued2014
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/23806
dc.sourceIIOimport
dc.titleEngineering of Hf1-xAlxOy amorphous dielectrics for high-performance RRAM applications
dc.typeProceedings paper
dc.contributor.imecauthorFantini, Andrea
dc.contributor.imecauthorGoux, Ludovic
dc.contributor.imecauthorClima, Sergiu
dc.contributor.imecauthorDegraeve, Robin
dc.contributor.imecauthorRedolfi, Augusto
dc.contributor.imecauthorAdelmann, Christoph
dc.contributor.imecauthorChen, Yangyin
dc.contributor.imecauthorBelmonte, Attilio
dc.contributor.imecauthorJurczak, Gosia
dc.contributor.orcidimecGoux, Ludovic::0000-0002-1276-2278
dc.contributor.orcidimecClima, Sergiu::0000-0002-4044-9975
dc.contributor.orcidimecAdelmann, Christoph::0000-0002-4831-3159
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage1
dc.source.endpage4
dc.source.conferenceIEEE 6th International Memory Workshop - IMW
dc.source.conferencedate18/05/2014
dc.source.conferencelocationTaipei Taiwan
dc.identifier.urlhttp://ieeexplore.ieee.org/xpl/articleDetails.jsp?arnumber=6849354
imec.availabilityPublished - open access


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