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Calibration and application of a DSA Compact model for grapho-epitaxy hole processes using contour-based metrology

dc.contributor.authorFenger, Germain
dc.contributor.authorBurbine, Andrew
dc.contributor.authorTorres, J. Andres
dc.contributor.authorMa, Yuansheng
dc.contributor.authorGranik, Yuri
dc.contributor.authorKrasnova, Polina
dc.contributor.authorVandenberghe, Geert
dc.contributor.authorGronheid, Roel
dc.contributor.authorBekaert, Joost
dc.date.accessioned2021-10-22T01:27:06Z
dc.date.available2021-10-22T01:27:06Z
dc.date.issued2014
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/23811
dc.sourceIIOimport
dc.titleCalibration and application of a DSA Compact model for grapho-epitaxy hole processes using contour-based metrology
dc.typeProceedings paper
dc.contributor.imecauthorVandenberghe, Geert
dc.contributor.imecauthorGronheid, Roel
dc.contributor.imecauthorBekaert, Joost
dc.contributor.orcidimecBekaert, Joost::0000-0003-3075-3479
dc.source.peerreviewyes
dc.source.beginpage92351X
dc.source.conferencePhotomask Technology
dc.source.conferencedate16/09/2014
dc.source.conferencelocationMonterey, CA USA
dc.identifier.urlhttp://proceedings.spiedigitallibrary.org/proceeding.aspx?articleid=1916444
imec.availabilityPublished - imec
imec.internalnotesProceedings of SPIE; Vol. 9235


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