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Large area interposer lithography

dc.contributor.authorFlack, Warren
dc.contributor.authorHsieh, Robert
dc.contributor.authorKenyon, Gareth
dc.contributor.authorRanjan, Manish
dc.contributor.authorSlabbekoorn, John
dc.contributor.authorMiller, Andy
dc.contributor.authorBeyne, Eric
dc.contributor.authorToukhy, Medhat
dc.contributor.authorLu, PingHung
dc.contributor.authorYi, Cao
dc.contributor.authorChen, Chunwei
dc.date.accessioned2021-10-22T01:29:05Z
dc.date.available2021-10-22T01:29:05Z
dc.date.issued2014
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/23820
dc.sourceIIOimport
dc.titleLarge area interposer lithography
dc.typeProceedings paper
dc.contributor.imecauthorSlabbekoorn, John
dc.contributor.imecauthorMiller, Andy
dc.contributor.imecauthorBeyne, Eric
dc.contributor.orcidimecBeyne, Eric::0000-0002-3096-050X
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage26
dc.source.endpage32
dc.source.conferenceIEEE 64th Electronic Components and Technology Conference - ECTC
dc.source.conferencedate27/05/2014
dc.source.conferencelocationOrlando, FL USA
dc.identifier.urlhttp://ieeexplore.ieee.org/xpl/articleDetails.jsp?arnumber=6897262
imec.availabilityPublished - open access


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