dc.contributor.author | Fuchimoto, Daisuke | |
dc.contributor.author | Ishimoto, Toru | |
dc.contributor.author | Hiroyuki, Shindo | |
dc.contributor.author | Sugahara, Hitoshi | |
dc.contributor.author | Toyoda, Yasutaka | |
dc.contributor.author | Mailfert, Julien | |
dc.contributor.author | De Bisschop, Peter | |
dc.date.accessioned | 2021-10-22T01:33:04Z | |
dc.date.available | 2021-10-22T01:33:04Z | |
dc.date.issued | 2014 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/23836 | |
dc.source | IIOimport | |
dc.title | Contour-based metrology for complex 2D shaped patterns printed by multiple-patterning process | |
dc.type | Proceedings paper | |
dc.contributor.imecauthor | Mailfert, Julien | |
dc.contributor.imecauthor | De Bisschop, Peter | |
dc.date.embargo | 9999-12-31 | |
dc.source.peerreview | yes | |
dc.source.beginpage | 90500V | |
dc.source.conference | Metrology, Inspection, and Process Control for Microlithography XXVIII | |
dc.source.conferencedate | 23/02/2014 | |
dc.source.conferencelocation | San Jose, CA USA | |
dc.identifier.url | http://proceedings.spiedigitallibrary.org/proceeding.aspx?articleid=1859765 | |
imec.availability | Published - open access | |
imec.internalnotes | Proceedings of SPIE; Vol. 9050 | |