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Chemical vapor deposition processes for the fabrication of epitaxial Si-O superlattices

dc.contributor.authorJayachandran, Suseendran
dc.contributor.authorDelabie, Annelies
dc.contributor.authorMaggen, Jens
dc.contributor.authorCaymax, Matty
dc.contributor.authorLoo, Roger
dc.contributor.authorMeersschaut, Johan
dc.contributor.authorLenka, Hara
dc.contributor.authorVandervorst, Wilfried
dc.contributor.authorHeyns, Marc
dc.date.accessioned2021-10-22T02:20:28Z
dc.date.available2021-10-22T02:20:28Z
dc.date.issued2014
dc.identifier.issn0040-6090
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/24007
dc.sourceIIOimport
dc.titleChemical vapor deposition processes for the fabrication of epitaxial Si-O superlattices
dc.typeJournal article
dc.contributor.imecauthorJayachandran, Suseendran
dc.contributor.imecauthorDelabie, Annelies
dc.contributor.imecauthorCaymax, Matty
dc.contributor.imecauthorLoo, Roger
dc.contributor.imecauthorMeersschaut, Johan
dc.contributor.imecauthorVandervorst, Wilfried
dc.contributor.imecauthorHeyns, Marc
dc.contributor.orcidimecLoo, Roger::0000-0003-3513-6058
dc.contributor.orcidimecMeersschaut, Johan::0000-0003-2467-1784
dc.source.peerreviewyes
dc.source.beginpage36
dc.source.endpage41
dc.source.journalThin Solid Films
dc.source.volume557
dc.identifier.urlhttp://www.sciencedirect.com/science/article/pii/S0040609013016908
imec.availabilityPublished - imec


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