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Towards reduced impact of EUV mask defectivity on wafer

dc.contributor.authorJonckheere, Rik
dc.contributor.authorVan Den Heuvel, Dieter
dc.contributor.authorPacco, Antoine
dc.contributor.authorPollentier, Ivan
dc.contributor.authorBaudemprez, Bart
dc.contributor.authorJehoul, Christiane
dc.contributor.authorHermans, Jan
dc.contributor.authorHendrickx, Eric
dc.date.accessioned2021-10-22T02:22:46Z
dc.date.available2021-10-22T02:22:46Z
dc.date.issued2014-07
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/24014
dc.sourceIIOimport
dc.titleTowards reduced impact of EUV mask defectivity on wafer
dc.typeProceedings paper
dc.contributor.imecauthorJonckheere, Rik
dc.contributor.imecauthorVan Den Heuvel, Dieter
dc.contributor.imecauthorPacco, Antoine
dc.contributor.imecauthorPollentier, Ivan
dc.contributor.imecauthorBaudemprez, Bart
dc.contributor.imecauthorJehoul, Christiane
dc.contributor.imecauthorHermans, Jan
dc.contributor.imecauthorHendrickx, Eric
dc.contributor.orcidimecJonckheere, Rik::0000-0003-2211-9443
dc.contributor.orcidimecPollentier, Ivan::0000-0002-4266-6500
dc.contributor.orcidimecHermans, Jan::0000-0003-1249-8902
dc.source.peerreviewyes
dc.source.beginpage92560L
dc.source.conferencePhotomask and Next Generation Lithography Mask Technology XXI
dc.source.conferencedate15/04/2014
dc.source.conferencelocationYokohama Japan
dc.identifier.urlhttp://spie.org/Publications/Proceedings/Paper/10.1117/12.2070045
imec.availabilityPublished - imec
imec.internalnotesProceedings of SPIE; Vol. 9256


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