Authors

Kearney, Patrick; Wood, Obert; Hendrickx, Eric; McIntyre, Greg; Soichi, Inoue; Goodwin, Frank; Wurm, Stephan; Van Schoot, Jan; Kaiser, Winfried

Conference

Extreme Ultraviolet (EUV) Lithography V

Title

Driving the industry towards a consensus on high numerical aperture (High-NA) extreme ultraviolet (EUV)

Publication type

Proceedings paper

Embargo date

9999-12-31