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dc.contributor.authorMallik, Arindam
dc.contributor.authorHoriguchi, Naoto
dc.contributor.authorBoemmels, Juergen
dc.contributor.authorThean, Aaron
dc.contributor.authorBarla, Kathy
dc.contributor.authorVandenberghe, Geert
dc.contributor.authorRonse, Kurt
dc.contributor.authorRyckaert, Julien
dc.contributor.authorMercha, Abdelkarim
dc.contributor.authorAltimime, Laith
dc.contributor.authorVerkest, Diederik
dc.contributor.authorSteegen, An
dc.date.accessioned2021-10-22T03:25:37Z
dc.date.available2021-10-22T03:25:37Z
dc.date.issued2014
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/24192
dc.sourceIIOimport
dc.titleThe economic impact of EUV lithography on critical process modules
dc.typeProceedings paper
dc.contributor.imecauthorMallik, Arindam
dc.contributor.imecauthorHoriguchi, Naoto
dc.contributor.imecauthorBoemmels, Juergen
dc.contributor.imecauthorThean, Aaron
dc.contributor.imecauthorBarla, Kathy
dc.contributor.imecauthorVandenberghe, Geert
dc.contributor.imecauthorRonse, Kurt
dc.contributor.imecauthorRyckaert, Julien
dc.contributor.imecauthorMercha, Abdelkarim
dc.contributor.imecauthorVerkest, Diederik
dc.contributor.orcidimecMallik, Arindam::0000-0002-0742-9366
dc.contributor.orcidimecHoriguchi, Naoto::0000-0001-5490-0416
dc.contributor.orcidimecRonse, Kurt::0000-0003-0803-4267
dc.contributor.orcidimecMercha, Abdelkarim::0000-0002-2174-6958
dc.contributor.orcidimecVerkest, Diederik::0000-0001-6567-2746
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage90481R
dc.source.conferenceExtreme Ultraviolet (EUV) Lithgraphy V
dc.source.conferencedate23/02/2014
dc.source.conferencelocationSan Jose, CA USA
dc.identifier.urlhttp://proceedings.spiedigitallibrary.org/proceeding.aspx?articleid=1864011
imec.availabilityPublished - open access
imec.internalnotesProceedings of SPIE; Vol. 9048


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