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Development and characterization of a fast neutral beam source for damage-free etching

dc.contributor.authorMarinov, Daniil
dc.contributor.authorEl Otell, Ziad
dc.contributor.authorBowden, Mark
dc.contributor.authorBraithwaite, Nicholas
dc.date.accessioned2021-10-22T03:32:29Z
dc.date.available2021-10-22T03:32:29Z
dc.date.issued2014
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/24211
dc.sourceIIOimport
dc.titleDevelopment and characterization of a fast neutral beam source for damage-free etching
dc.typeMeeting abstract
dc.contributor.imecauthorEl Otell, Ziad
dc.source.peerreviewno
dc.source.beginpagena
dc.source.conference41st IOP Plasma Physics Conference
dc.source.conferencedate14/04/2014
dc.source.conferencelocationLondon UK
imec.availabilityPublished - imec


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