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Ge FET fabrication by plasma etch at 45nm pitch

dc.contributor.authorMilenin, Alexey
dc.contributor.authorWitters, Liesbeth
dc.date.accessioned2021-10-22T03:48:03Z
dc.date.available2021-10-22T03:48:03Z
dc.date.issued2014
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/24252
dc.sourceIIOimport
dc.titleGe FET fabrication by plasma etch at 45nm pitch
dc.typeMeeting abstract
dc.contributor.imecauthorMilenin, Alexey
dc.contributor.imecauthorWitters, Liesbeth
dc.contributor.orcidimecMilenin, Alexey::0000-0003-0747-0462
dc.source.peerreviewyes
dc.source.beginpage1675
dc.source.conferenceElectrochemical Society Fall Meeting Symposium: Plasma Processing 20
dc.source.conferencedate5/10/2014
dc.source.conferencelocationCancun Mexico
dc.identifier.urlhttps://ecs.confex.com/ecs/226/webprogram/Paper40500.html
imec.availabilityPublished - imec


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