Show simple item record

NW-TFET analog performance for different gate oxide thickness and Ge source

dc.contributor.authorNeves Souza, Felipe
dc.contributor.authorAgopian, Paula G.D.
dc.contributor.authorMartino, Joao Antonio
dc.contributor.authorRooyackers, Rita
dc.contributor.authorVandooren, Anne
dc.contributor.authorSimoen, Eddy
dc.contributor.authorThean, Aaron
dc.contributor.authorClaeys, Cor
dc.date.accessioned2021-10-22T04:17:18Z
dc.date.available2021-10-22T04:17:18Z
dc.date.issued2014
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/24320
dc.sourceIIOimport
dc.titleNW-TFET analog performance for different gate oxide thickness and Ge source
dc.typeProceedings paper
dc.contributor.imecauthorVandooren, Anne
dc.contributor.imecauthorSimoen, Eddy
dc.contributor.imecauthorThean, Aaron
dc.contributor.orcidimecVandooren, Anne::0000-0002-2412-0176
dc.contributor.orcidimecSimoen, Eddy::0000-0002-5218-4046
dc.source.peerreviewyes
dc.source.beginpage1
dc.source.endpage2
dc.source.conference10th Workshop on the Thematic Network on Silicon on Insulator Technology, Devices and Circuits - EUROSOI
dc.source.conferencedate27/01/2014
dc.source.conferencelocationTaragona Spain
imec.availabilityPublished - imec


Files in this item

FilesSizeFormatView

There are no files associated with this item.

This item appears in the following collection(s)

Show simple item record