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Spectroscopic critical dimension technology (SCD) for directed self assembly

dc.contributor.authorNishibe, Senichi
dc.contributor.authorDziura, Thaddeus
dc.contributor.authorNagaswami, Venkat
dc.contributor.authorGronheid, Roel
dc.date.accessioned2021-10-22T04:18:53Z
dc.date.available2021-10-22T04:18:53Z
dc.date.issued2014
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/24324
dc.sourceIIOimport
dc.titleSpectroscopic critical dimension technology (SCD) for directed self assembly
dc.typeProceedings paper
dc.contributor.imecauthorGronheid, Roel
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage90502U
dc.source.conferenceMetrology, Inspection, and Process Control for Microlithography XXVIII
dc.source.conferencedate24/02/2014
dc.source.conferencelocationSan Jose, CA USA
dc.identifier.urlhttp://proceedings.spiedigitallibrary.org/proceeding.aspx?articleid=1859819
imec.availabilityPublished - open access
imec.internalnotesProceedings of SPIE; Vol. 9050


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