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Focus spot reduction by brush scrubber cleaning

dc.contributor.authorPacco, Antoine
dc.contributor.authorKesters, Els
dc.contributor.authorSimms, Ihsan
dc.contributor.authorNafus, Kathleen
dc.contributor.authorVandereyken, Jelle
dc.contributor.authorYonekawa, Hiroki
dc.date.accessioned2021-10-22T04:31:13Z
dc.date.available2021-10-22T04:31:13Z
dc.date.issued2014
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/24354
dc.sourceIIOimport
dc.titleFocus spot reduction by brush scrubber cleaning
dc.typeProceedings paper
dc.contributor.imecauthorPacco, Antoine
dc.contributor.imecauthorKesters, Els
dc.contributor.imecauthorNafus, Kathleen
dc.contributor.imecauthorVandereyken, Jelle
dc.source.peerreviewno
dc.source.beginpage276
dc.source.endpage279
dc.source.conferenceUltra Clean Processing of Semiconductor Surfaces - UCPSS XII
dc.source.conferencedate22/09/2014
dc.source.conferencelocationBrussels Belgium
dc.identifier.urlhttp://www.scientific.net/SSP.219.276
imec.availabilityPublished - imec
imec.internalnotesSolid-State phenomena; Vol. 219


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