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dc.contributor.authorPhilipsen, Vicky
dc.contributor.authorHendrickx, Eric
dc.contributor.authorVerduijn, Erik
dc.contributor.authorRaghunathan, Sudhar
dc.contributor.authorWood, Obert
dc.contributor.authorSoltwisch, Victor
dc.contributor.authorScholze, Frank
dc.contributor.authorDavydova, Natalia
dc.contributor.authorMangat, Pawitter
dc.date.accessioned2021-10-22T04:44:47Z
dc.date.available2021-10-22T04:44:47Z
dc.date.issued2014
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/24385
dc.sourceIIOimport
dc.titleImaging impact of multilayer tuning in EUV masks, experimental validation
dc.typeProceedings paper
dc.contributor.imecauthorPhilipsen, Vicky
dc.contributor.imecauthorHendrickx, Eric
dc.contributor.imecauthorVerduijn, Erik
dc.contributor.orcidimecPhilipsen, Vicky::0000-0002-2959-432X
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage92350J
dc.source.conferencePhotomask Technology 2014, BACUS
dc.source.conferencedate16/09/2014
dc.source.conferencelocationMonterey, CA USA
dc.identifier.urlhttp://proceedings.spiedigitallibrary.org/proceeding.aspx?articleid=1918462
imec.availabilityPublished - open access
imec.internalnotesProceedings of SPIE; Vol. 9235


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