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Low-k films modification under EUV and VUV radiation

dc.contributor.authorRakhimova, T.
dc.contributor.authorRakhimov, A.
dc.contributor.authorMankelevich, Y.A.
dc.contributor.authorLopaev, D.V.
dc.contributor.authorKovalev, A.S.
dc.contributor.authorVasil'eva, A.N.
dc.contributor.authorZyryanov, S.M.
dc.contributor.authorKurchikov, K.
dc.contributor.authorProshina, O.
dc.contributor.authorVoloshin, D.G.
dc.contributor.authorNovikova, N.N.
dc.contributor.authorKrishtab, Mikhail
dc.contributor.authorBaklanov, Mikhaïl
dc.date.accessioned2021-10-22T04:58:39Z
dc.date.available2021-10-22T04:58:39Z
dc.date.issued2014
dc.identifier.issn0022-3727
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/24416
dc.sourceIIOimport
dc.titleLow-k films modification under EUV and VUV radiation
dc.typeJournal article
dc.contributor.imecauthorKrishtab, Mikhail
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage25102
dc.source.journalJournal of Physics D: Applied Physics
dc.source.issue2
dc.source.volume47
dc.identifier.urlhttp://iopscience.iop.org/0022-3727/47/2/025102/pdf/0022-3727_47_2_025102.pdf
imec.availabilityPublished - open access


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