dc.contributor.author | Schram, Tom | |
dc.contributor.author | Spessot, Alessio | |
dc.contributor.author | Ritzenthaler, Romain | |
dc.contributor.author | Rosseel, Erik | |
dc.contributor.author | Caillat, Christian | |
dc.contributor.author | Horiguchi, Naoto | |
dc.date.accessioned | 2021-10-22T05:36:58Z | |
dc.date.available | 2021-10-22T05:36:58Z | |
dc.date.issued | 2014 | |
dc.identifier.issn | 0167-9317 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/24498 | |
dc.source | IIOimport | |
dc.title | Ni(Pt) silicide with improved thermal stability for application in DRAM periphery and replacement metal gate devices | |
dc.type | Journal article | |
dc.contributor.imecauthor | Schram, Tom | |
dc.contributor.imecauthor | Spessot, Alessio | |
dc.contributor.imecauthor | Ritzenthaler, Romain | |
dc.contributor.imecauthor | Rosseel, Erik | |
dc.contributor.imecauthor | Horiguchi, Naoto | |
dc.contributor.orcidimec | Schram, Tom::0000-0003-1533-7055 | |
dc.contributor.orcidimec | Ritzenthaler, Romain::0000-0002-8615-3272 | |
dc.contributor.orcidimec | Horiguchi, Naoto::0000-0001-5490-0416 | |
dc.date.embargo | 9999-12-31 | |
dc.source.peerreview | yes | |
dc.source.beginpage | 157 | |
dc.source.endpage | 162 | |
dc.source.journal | Microelectronic Engineering | |
dc.source.volume | 120 | |
dc.identifier.url | http://www.sciencedirect.com/science/article/pii/S0167931713007004 | |
imec.availability | Published - open access | |