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Ni(Pt) silicide with improved thermal stability for application in DRAM periphery and replacement metal gate devices
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Authors
Schram, Tom
;
Spessot, Alessio
;
Ritzenthaler, Romain
;
Rosseel, Erik
;
Caillat, Christian
;
Horiguchi, Naoto
ISSN
0167-9317
Journal
Microelectronic Engineering
Volume
120
Title
Ni(Pt) silicide with improved thermal stability for application in DRAM periphery and replacement metal gate devices
Publication type
Journal article
Embargo date
9999-12-31
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