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Articles
Ni(Pt) silicide with improved thermal stability for application in DRAM periphery and replacement metal gate devices
Publication:
Ni(Pt) silicide with improved thermal stability for application in DRAM periphery and replacement metal gate devices
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Date
2014
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Schram, Tom
;
Spessot, Alessio
;
Ritzenthaler, Romain
;
Rosseel, Erik
;
Caillat, Christian
;
Horiguchi, Naoto
Journal
Microelectronic Engineering
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Acq. date: 2025-12-10
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Acq. date: 2025-12-10
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Downloads
2
since deposited on 2021-10-22
Acq. date: 2025-12-10
Views
1927
since deposited on 2021-10-22
6
last month
2
last week
Acq. date: 2025-12-10
Citations