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Enhancing etch contrast in DSA block copolymer films with sequential infiltration synthesis on 300mm Si substrates

dc.contributor.authorSingh, Arjun
dc.contributor.authorSayan, Safak
dc.contributor.authorEl Otell, Ziad
dc.contributor.authorChan, BT
dc.contributor.authorGronheid, Roel
dc.date.accessioned2021-10-22T05:54:14Z
dc.date.available2021-10-22T05:54:14Z
dc.date.issued2014
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/24534
dc.sourceIIOimport
dc.titleEnhancing etch contrast in DSA block copolymer films with sequential infiltration synthesis on 300mm Si substrates
dc.typeMeeting abstract
dc.contributor.imecauthorSingh, Arjun
dc.contributor.imecauthorEl Otell, Ziad
dc.contributor.imecauthorChan, BT
dc.contributor.imecauthorGronheid, Roel
dc.contributor.orcidimecChan, BT::0000-0003-2890-0388
dc.source.peerreviewno
dc.source.conferenceSPIE Advanced Lithography
dc.source.conferencedate22/02/2015
dc.source.conferencelocationSan Jose, CA USA
imec.availabilityPublished - imec
imec.internalnotes


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