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Investigation of interactions between metrology and lithography with a CD SEM simulator
Publication:
Investigation of interactions between metrology and lithography with a CD SEM simulator
Date
2014
Proceedings Paper
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35798.pdf
1.61 MB
Basic data
APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Smith, Mark D.
;
Fang, Chao
;
Biafore, John J.
;
Vaglio Pret, Alessandro
;
Robinson, Stewart A.
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Abstract
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Metrics
Views
1922
since deposited on 2021-10-22
425
item.page.metrics.field.last-week
Acq. date: 2025-10-25
Citations