Investigation of interactions between metrology and lithography with a CD SEM simulator

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Authors
Smith, Mark D.; Fang, Chao; Biafore, John J.; Vaglio Pret, Alessandro; Robinson, Stewart A.
Conference
Advances in Patterning Materials and Processes XXXI
Title
Investigation of interactions between metrology and lithography with a CD SEM simulator
Publication type
Proceedings paper
Embargo date
9999-12-31
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