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Challenges of dense and isolated structure patterning: depth loading study in STI

dc.contributor.authorSong, Yang
dc.contributor.authorMilenin, Alexey
dc.date.accessioned2021-10-22T06:03:08Z
dc.date.available2021-10-22T06:03:08Z
dc.date.issued2014
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/24551
dc.sourceIIOimport
dc.titleChallenges of dense and isolated structure patterning: depth loading study in STI
dc.typeOral presentation
dc.contributor.imecauthorMilenin, Alexey
dc.contributor.orcidimecMilenin, Alexey::0000-0003-0747-0462
dc.source.peerreviewno
dc.source.conferencePlasma Etch and Strip in Microtechnology - PESM
dc.source.conferencedate12/05/2014
dc.source.conferencelocationGrenoble France
dc.identifier.urlhttp://pesm2014.insight-outside.fr/index.php?langue=en&onglet=14&acces=&idUser=&emailUser=&PHPSESSID=a3ab919ce7af5a185bc62c2cbd6
imec.availabilityPublished - imec
imec.internalnotesIt was decided by PESM committee that the posters were not put online.


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