Show simple item record

Pattern fidelity verification for logic design in EUV lithography

dc.contributor.authorSugawara, Mino
dc.contributor.authorHendrickx, Eric
dc.contributor.authorPhilipsen, Vicky
dc.contributor.authorMaloney, Chris
dc.contributor.authorFenger, Germain
dc.date.accessioned2021-10-22T06:12:28Z
dc.date.available2021-10-22T06:12:28Z
dc.date.issued2014
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/24571
dc.sourceIIOimport
dc.titlePattern fidelity verification for logic design in EUV lithography
dc.typeProceedings paper
dc.contributor.imecauthorHendrickx, Eric
dc.contributor.imecauthorPhilipsen, Vicky
dc.contributor.orcidimecPhilipsen, Vicky::0000-0002-2959-432X
dc.source.peerreviewyes
dc.source.beginpage90480V
dc.source.conferenceExtreme Ultraviolet (EUV) Llithography V
dc.source.conferencedate23/02/2014
dc.source.conferencelocationSan Jose, CA USA
dc.identifier.urlhttp://proceedings.spiedigitallibrary.org/proceeding.aspx?articleid=1863987
imec.availabilityPublished - imec
imec.internalnotesProceedings of SPIE; Vol. 9048


Files in this item

FilesSizeFormatView

There are no files associated with this item.

This item appears in the following collection(s)

Show simple item record