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Impact of plasma pretreatment and pore size on the sealing of ultra low-k dielectrics by self-assembling monolayers

dc.contributor.authorSun, Yiting
dc.contributor.authorKrishtab, Mikhail
dc.contributor.authorStruyf, Herbert
dc.contributor.authorVerdonck, Patrick
dc.contributor.authorDe Feyter, Steven
dc.contributor.authorBaklanov, Mikhaïl
dc.contributor.authorArmini, Silvia
dc.date.accessioned2021-10-22T06:15:25Z
dc.date.available2021-10-22T06:15:25Z
dc.date.issued2014
dc.identifier.issn0743-7463
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/24577
dc.sourceIIOimport
dc.titleImpact of plasma pretreatment and pore size on the sealing of ultra low-k dielectrics by self-assembling monolayers
dc.typeJournal article
dc.contributor.imecauthorSun, Yiting
dc.contributor.imecauthorKrishtab, Mikhail
dc.contributor.imecauthorStruyf, Herbert
dc.contributor.imecauthorVerdonck, Patrick
dc.contributor.imecauthorArmini, Silvia
dc.contributor.orcidimecVerdonck, Patrick::0000-0003-2454-0602
dc.contributor.orcidimecArmini, Silvia::0000-0003-0578-3422
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage3832
dc.source.endpage3844
dc.source.journalLangmuir
dc.source.issue13
dc.source.volume30
dc.identifier.urlhttp://pubs.acs.org/doi/abs/10.1021/la404165n
imec.availabilityPublished - open access


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