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XPS and TOFSIMS studies of shallow Si/Si1-xGex/Si layers

dc.contributor.authorConard, Thierry
dc.contributor.authorDe Witte, Hilde
dc.contributor.authorVandervorst, Wilfried
dc.contributor.authorCaymax, Matty
dc.contributor.authorLoo, Roger
dc.contributor.authorVerheyen, P.
dc.contributor.authorGijbels, Renaat
dc.date.accessioned2021-09-30T11:36:04Z
dc.date.available2021-09-30T11:36:04Z
dc.date.issued1998
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/2459
dc.sourceIIOimport
dc.titleXPS and TOFSIMS studies of shallow Si/Si1-xGex/Si layers
dc.typeOral presentation
dc.contributor.imecauthorConard, Thierry
dc.contributor.imecauthorVandervorst, Wilfried
dc.contributor.imecauthorCaymax, Matty
dc.contributor.imecauthorLoo, Roger
dc.contributor.orcidimecConard, Thierry::0000-0002-4298-5851
dc.contributor.orcidimecLoo, Roger::0000-0003-3513-6058
dc.source.peerreviewno
dc.source.conferenceInternational Vacuum Congress (IVC-12); 31 August - 9 September 1998; Birmingham, UK.
dc.source.conferencelocation
imec.availabilityPublished - imec


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