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Layer on photoresist lines with an Ar/SiCl4/O2 inductively coupled plasma: a modeling investigation

dc.contributor.authorTinck, Stefan
dc.contributor.authorAltamirano Sanchez, Efrain
dc.contributor.authorDe Schepper, Peter
dc.contributor.authorBogaerts, Annemie
dc.date.accessioned2021-10-22T06:33:56Z
dc.date.available2021-10-22T06:33:56Z
dc.date.issued2014
dc.identifier.issn1612-8850
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/24615
dc.sourceIIOimport
dc.titleLayer on photoresist lines with an Ar/SiCl4/O2 inductively coupled plasma: a modeling investigation
dc.typeJournal article
dc.contributor.imecauthorAltamirano Sanchez, Efrain
dc.contributor.imecauthorDe Schepper, Peter
dc.source.peerreviewyes
dc.source.beginpage52
dc.source.endpage62
dc.source.journalPlasma Processes and Polymers
dc.source.issue1
dc.source.volume11
dc.identifier.urlhttp://onlinelibrary.wiley.com/doi/10.1002/ppap.201300062/abstract
imec.availabilityPublished - imec


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