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Layer on photoresist lines with an Ar/SiCl4/O2 inductively coupled plasma: a modeling investigation
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1942 since deposited on 2021-10-22
4last month
Acq. date: 2026-01-11
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Metrics
Views
1942 since deposited on 2021-10-22
4last month
Acq. date: 2026-01-11
Citations