Authors

Tinck, Stefan; Altamirano Sanchez, Efrain; De Schepper, Peter; Bogaerts, Annemie

ISSN

1612-8850

Issue

1

Journal

Plasma Processes and Polymers

Volume

11

Title

Layer on photoresist lines with an Ar/SiCl4/O2 inductively coupled plasma: a modeling investigation

Publication type

Journal article