Publication:
Layer on photoresist lines with an Ar/SiCl4/O2 inductively coupled plasma: a modeling investigation
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1944 since deposited on 2021-10-22
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Acq. date: 2026-01-27
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Statistics
Views
1944 since deposited on 2021-10-22
4last month
1last week
Acq. date: 2026-01-27
Citations