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Stochastic and systematic patterning failure mechanisms for contact-holes in EUV lithography: part 2

dc.contributor.authorVaglio Pret, Alessandro
dc.contributor.authorDe Bisschop, Peter
dc.contributor.authorSmith, Mark
dc.contributor.authorBiafore, John
dc.date.accessioned2021-10-22T06:48:21Z
dc.date.available2021-10-22T06:48:21Z
dc.date.issued2014
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/24644
dc.sourceIIOimport
dc.titleStochastic and systematic patterning failure mechanisms for contact-holes in EUV lithography: part 2
dc.typeProceedings paper
dc.contributor.imecauthorVaglio Pret, Alessandro
dc.contributor.imecauthorDe Bisschop, Peter
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage904834
dc.source.conferenceExtreme Ultraviolet (EUV) Lithography V
dc.source.conferencedate23/02/2014
dc.source.conferencelocationSan Jose, CA USA
dc.identifier.urlhttp://proceedings.spiedigitallibrary.org/proceeding.aspx?articleid=1851149
imec.availabilityPublished - open access
imec.internalnotesProceedings of SPIE; Vol. 9048


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