Publication:

Low-k a-SiCO:H films as diffusion barriers for advanced interconnects

Date

2014

Journal article

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Files

26006.pdf 476.91 KB

Author(s)

Van Besien, Els

;

;

Barbarin, Yohan

;

Verdonck, Patrick

;

Dekkers, Harold

;

Vanstreels, Kris

;

de Marneffe, Jean-Francois

;

Baklanov, Mikhaïl

;

Van Elshocht, Sven

Journal

Microelectronic Engineering

Statistics

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Acq. date: 2026-03-17