Show simple item record

Low-k a-SiCO:H films as diffusion barriers for advanced interconnects

dc.contributor.authorVan Besien, Els
dc.contributor.authorSingh, Arjun
dc.contributor.authorBarbarin, Yohan
dc.contributor.authorVerdonck, Patrick
dc.contributor.authorDekkers, Harold
dc.contributor.authorVanstreels, Kris
dc.contributor.authorde Marneffe, Jean-Francois
dc.contributor.authorBaklanov, Mikhaïl
dc.contributor.authorVan Elshocht, Sven
dc.date.accessioned2021-10-22T06:56:33Z
dc.date.available2021-10-22T06:56:33Z
dc.date.issued2014
dc.identifier.issn0167-9317
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/24660
dc.sourceIIOimport
dc.titleLow-k a-SiCO:H films as diffusion barriers for advanced interconnects
dc.typeJournal article
dc.contributor.imecauthorVan Besien, Els
dc.contributor.imecauthorSingh, Arjun
dc.contributor.imecauthorVerdonck, Patrick
dc.contributor.imecauthorDekkers, Harold
dc.contributor.imecauthorVanstreels, Kris
dc.contributor.imecauthorde Marneffe, Jean-Francois
dc.contributor.imecauthorVan Elshocht, Sven
dc.contributor.orcidimecVan Besien, Els::0000-0002-5174-2229
dc.contributor.orcidimecVerdonck, Patrick::0000-0003-2454-0602
dc.contributor.orcidimecDekkers, Harold::0000-0003-4778-5709
dc.contributor.orcidimecVanstreels, Kris::0000-0002-4420-0966
dc.contributor.orcidimecVan Elshocht, Sven::0000-0002-6512-1909
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage221
dc.source.endpage224
dc.source.journalMicroelectronic Engineering
dc.source.volume120
dc.identifier.urlhttp://www.sciencedirect.com/science/article/pii/S016793171300717X
imec.availabilityPublished - open access


Files in this item

Thumbnail
Name:
26006.pdf
Size:
476.9Kb
Format:
PDF
View/open

This item appears in the following collection(s)

Show simple item record