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Nanoscale etching and surface preparation of III-V materials for advanced CMOS processing

dc.contributor.authorvan Dorp, Dennis
dc.date.accessioned2021-10-22T07:07:43Z
dc.date.available2021-10-22T07:07:43Z
dc.date.issued2014
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/24684
dc.sourceIIOimport
dc.titleNanoscale etching and surface preparation of III-V materials for advanced CMOS processing
dc.typeOral presentation
dc.contributor.imecauthorvan Dorp, Dennis
dc.contributor.orcidimecvan Dorp, Dennis::0000-0002-1085-4232
dc.source.peerreviewno
dc.source.conference12th International Symposium on Ultra Clean Processing of Semiconductor Surfaces - UCPSS
dc.source.conferencedate21/09/2014
dc.source.conferencelocationBrussels Belgium
imec.availabilityPublished - imec


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