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Alternative EUV mask technology for mask 3D effect compensation

dc.contributor.authorVan Look, Lieve
dc.contributor.authorPhilipsen, Vicky
dc.contributor.authorHendrickx, Eric
dc.contributor.authorVandenberghe, Geert
dc.contributor.authorKnops, Roel
dc.contributor.authorDavydova, Natalia
dc.contributor.authorWittebrood, Friso
dc.contributor.authorDe Kruif, Robert
dc.contributor.authorVan Oosten, Anton
dc.contributor.authorFliervoet, Timon
dc.contributor.authorVan Schoot, Jan
dc.contributor.authorNeumann, Jens Timo
dc.date.accessioned2021-10-22T07:19:22Z
dc.date.available2021-10-22T07:19:22Z
dc.date.issued2014
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/24708
dc.sourceIIOimport
dc.titleAlternative EUV mask technology for mask 3D effect compensation
dc.typeProceedings paper
dc.contributor.imecauthorVan Look, Lieve
dc.contributor.imecauthorPhilipsen, Vicky
dc.contributor.imecauthorHendrickx, Eric
dc.contributor.imecauthorVandenberghe, Geert
dc.contributor.imecauthorFliervoet, Timon
dc.contributor.orcidimecPhilipsen, Vicky::0000-0002-2959-432X
dc.source.peerreviewno
dc.source.conferenceInternational Symposium on Extreme Ultraviolet Lithography - EUVL
dc.source.conferencedate27/10/2014
dc.source.conferencelocationWashington United States of Amerika
dc.identifier.urlhttp://www.cvent.com/events/2014-international-symposium-on-extreme-ultraviolet-lithography/custom-115-011f0e62fcbf423683889785e
imec.availabilityPublished - imec


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