Show simple item record

Advanced lithography materials as key scaling enablers

dc.contributor.authorVandenberghe, Geert
dc.contributor.authorDe Simone, Danilo
dc.contributor.authorGronheid, Roel
dc.date.accessioned2021-10-22T07:27:38Z
dc.date.available2021-10-22T07:27:38Z
dc.date.issued2014
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/24725
dc.sourceIIOimport
dc.titleAdvanced lithography materials as key scaling enablers
dc.typeProceedings paper
dc.contributor.imecauthorVandenberghe, Geert
dc.contributor.imecauthorDe Simone, Danilo
dc.contributor.imecauthorGronheid, Roel
dc.contributor.orcidimecDe Simone, Danilo::0000-0003-3927-5207
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage7A-8-2
dc.source.conference27th International Microprocesses and Nanotechnology Conference - MNC
dc.source.conferencedate4/11/2014
dc.source.conferencelocationFukuoka Japan
imec.availabilityPublished - open access


Files in this item

Thumbnail
Name:
31320.pdf
Size:
558.3Kb
Format:
PDF
View/open

This item appears in the following collection(s)

Show simple item record