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Advanced PECVD SiCOH low-k films with low dielectric constant and/or high Young's modulus

dc.contributor.authorVerdonck, Patrick
dc.contributor.authorWang, Cong
dc.contributor.authorLe, Quoc Toan
dc.contributor.authorSouriau, Laurent
dc.contributor.authorVanstreels, Kris
dc.contributor.authorKrishtab, Mikhail
dc.contributor.authorBaklanov, Mikhaïl
dc.date.accessioned2021-10-22T07:47:45Z
dc.date.available2021-10-22T07:47:45Z
dc.date.issued2014
dc.identifier.issn0167-9317
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/24763
dc.sourceIIOimport
dc.titleAdvanced PECVD SiCOH low-k films with low dielectric constant and/or high Young's modulus
dc.typeJournal article
dc.contributor.imecauthorVerdonck, Patrick
dc.contributor.imecauthorLe, Quoc Toan
dc.contributor.imecauthorSouriau, Laurent
dc.contributor.imecauthorVanstreels, Kris
dc.contributor.imecauthorKrishtab, Mikhail
dc.contributor.orcidimecVerdonck, Patrick::0000-0003-2454-0602
dc.contributor.orcidimecLe, Quoc Toan::0000-0002-0206-6279
dc.contributor.orcidimecSouriau, Laurent::0000-0002-5138-5938
dc.contributor.orcidimecVanstreels, Kris::0000-0002-4420-0966
dc.contributor.orcidimecKrishtab, Mikhail::0000-0001-6215-8506
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage225
dc.source.endpage229
dc.source.journalMicroelectronic Engineering
dc.source.volume120
dc.identifier.urlhttp://www.sciencedirect.com/science/article/pii/S016793171300659X#
imec.availabilityPublished - imec


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