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Study of wetting of nanostructures using decoration by etching

dc.contributor.authorVereecke, Guy
dc.contributor.authorXu, XiuMei
dc.contributor.authorKesters, Els
dc.contributor.authorSimms, Ishan
dc.contributor.authorNafus, Kathleen
dc.contributor.authorHaensel, Leander
dc.contributor.authorKim, Tae-Gon
dc.contributor.authorLismont, Mark
dc.contributor.authorHolsteyns, Frank
dc.contributor.authorDe Gendt, Stefan
dc.date.accessioned2021-10-22T07:49:51Z
dc.date.available2021-10-22T07:49:51Z
dc.date.issued2014
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/24767
dc.sourceIIOimport
dc.titleStudy of wetting of nanostructures using decoration by etching
dc.typeProceedings paper
dc.contributor.imecauthorVereecke, Guy
dc.contributor.imecauthorXu, XiuMei
dc.contributor.imecauthorKesters, Els
dc.contributor.imecauthorNafus, Kathleen
dc.contributor.imecauthorLismont, Mark
dc.contributor.imecauthorHolsteyns, Frank
dc.contributor.imecauthorDe Gendt, Stefan
dc.contributor.orcidimecVereecke, Guy::0000-0001-9058-9338
dc.contributor.orcidimecXu, XiuMei::0000-0002-3356-8693
dc.contributor.orcidimecDe Gendt, Stefan::0000-0003-3775-3578
dc.source.peerreviewyes
dc.source.beginpage111
dc.source.endpage114
dc.source.conferenceUltra Clean Processing of Semiconductor Surfaces XII - UCPSS XII
dc.source.conferencedate21/09/2014
dc.source.conferencelocationBrussels Belgium
dc.identifier.urlhttp://www.scientific.net/SSP.219.111
imec.availabilityPublished - imec
imec.internalnotesSolid State Phenomena; Vol. 219


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