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Root-cause failure analysis reveals harmful interaction between non-adjacent MoO3 and Al layers

dc.contributor.authorVoroshazi, Eszter
dc.contributor.authorUytterhoeven, Griet
dc.contributor.authorFavia, Paola
dc.contributor.authorBender, Hugo
dc.contributor.authorConard, Thierry
dc.contributor.authorCnops, Kjell
dc.contributor.authorCheyns, David
dc.date.accessioned2021-10-22T08:04:54Z
dc.date.available2021-10-22T08:04:54Z
dc.date.issued2014
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/24795
dc.sourceIIOimport
dc.titleRoot-cause failure analysis reveals harmful interaction between non-adjacent MoO3 and Al layers
dc.typeProceedings paper
dc.contributor.imecauthorVoroshazi, Eszter
dc.contributor.imecauthorUytterhoeven, Griet
dc.contributor.imecauthorFavia, Paola
dc.contributor.imecauthorBender, Hugo
dc.contributor.imecauthorConard, Thierry
dc.contributor.imecauthorCheyns, David
dc.contributor.orcidimecUytterhoeven, Griet::0000-0001-7052-2590
dc.contributor.orcidimecFavia, Paola::0000-0002-1019-3497
dc.contributor.orcidimecConard, Thierry::0000-0002-4298-5851
dc.contributor.orcidimecCheyns, David::0000-0002-1327-8752
dc.source.peerreviewno
dc.source.beginpageP2.07
dc.source.conferenceMRS Fall Meeting Symposium P: Hybrid Oxide/Organic Interfaces in Organic Electronics
dc.source.conferencedate30/11/2014
dc.source.conferencelocationBoston, MA USA
dc.identifier.urlhttps://mrsfall14.zerista.com/event/member/146433
imec.availabilityPublished - imec


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