dc.contributor.author | Mertens, Paul | |
dc.contributor.author | Hurd, Trace | |
dc.contributor.author | Gräf, D. | |
dc.contributor.author | Meuris, Marc | |
dc.contributor.author | Schmidt, Harald | |
dc.contributor.author | Heyns, Marc | |
dc.contributor.author | Kwakman, L. | |
dc.contributor.author | Hendriks, M. | |
dc.contributor.author | Kubota, M. | |
dc.date.accessioned | 2021-09-29T12:43:35Z | |
dc.date.available | 2021-09-29T12:43:35Z | |
dc.date.issued | 1994 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/247 | |
dc.source | IIOimport | |
dc.title | Cleaning of metal contamination | |
dc.type | Proceedings paper | |
dc.contributor.imecauthor | Mertens, Paul | |
dc.contributor.imecauthor | Meuris, Marc | |
dc.contributor.imecauthor | Heyns, Marc | |
dc.contributor.orcidimec | Meuris, Marc::0000-0002-9580-6810 | |
dc.date.embargo | 9999-12-31 | |
dc.source.peerreview | no | |
dc.source.beginpage | 241 | |
dc.source.endpage | 252 | |
dc.source.conference | Contamination Control and Defect Reduction in Semiconductor Manufacturing III | |
dc.source.conferencedate | 23/05/1994 | |
dc.source.conferencelocation | San Francisco, CA USA | |
imec.availability | Published - open access | |
imec.internalnotes | ECS Proceedings; Vol. PV94-9 | |