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dc.contributor.authorMertens, Paul
dc.contributor.authorHurd, Trace
dc.contributor.authorGräf, D.
dc.contributor.authorMeuris, Marc
dc.contributor.authorSchmidt, Harald
dc.contributor.authorHeyns, Marc
dc.contributor.authorKwakman, L.
dc.contributor.authorHendriks, M.
dc.contributor.authorKubota, M.
dc.date.accessioned2021-09-29T12:43:35Z
dc.date.available2021-09-29T12:43:35Z
dc.date.issued1994
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/247
dc.sourceIIOimport
dc.titleCleaning of metal contamination
dc.typeProceedings paper
dc.contributor.imecauthorMertens, Paul
dc.contributor.imecauthorMeuris, Marc
dc.contributor.imecauthorHeyns, Marc
dc.contributor.orcidimecMeuris, Marc::0000-0002-9580-6810
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage241
dc.source.endpage252
dc.source.conferenceContamination Control and Defect Reduction in Semiconductor Manufacturing III
dc.source.conferencedate23/05/1994
dc.source.conferencelocationSan Francisco, CA USA
imec.availabilityPublished - open access
imec.internalnotesECS Proceedings; Vol. PV94-9


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