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Tuning the strength of chemical patterns for directed self-assembly of block copolymers

dc.contributor.authorWilliamson, Lance
dc.contributor.authorLin, Guanyang
dc.contributor.authorCao, Yi
dc.contributor.authorGronheid, Roel
dc.contributor.authorNealey, Paul
dc.date.accessioned2021-10-22T08:18:49Z
dc.date.available2021-10-22T08:18:49Z
dc.date.issued2014
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/24820
dc.sourceIIOimport
dc.titleTuning the strength of chemical patterns for directed self-assembly of block copolymers
dc.typeProceedings paper
dc.contributor.imecauthorGronheid, Roel
dc.source.peerreviewyes
dc.source.beginpage90491B
dc.source.conferenceAlternative Lithographic Technologies VI
dc.source.conferencedate23/02/2014
dc.source.conferencelocationSan Jose, CA USA
dc.identifier.urlhttp://proceedings.spiedigitallibrary.org/proceeding.aspx?articleid=1857167
imec.availabilityPublished - imec
imec.internalnotesProceedings of SPIE; Vol. 9049


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