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Modelling the lithography of ion implantation resists on topography

dc.contributor.authorWinroth, Gustaf
dc.contributor.authorVaglio Pret, Alessandro
dc.contributor.authorErcken, Monique
dc.contributor.authorRobertson, Stewart
dc.contributor.authorBiafore, John J.
dc.date.accessioned2021-10-22T08:20:45Z
dc.date.available2021-10-22T08:20:45Z
dc.date.issued2014
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/24824
dc.sourceIIOimport
dc.titleModelling the lithography of ion implantation resists on topography
dc.typeProceedings paper
dc.contributor.imecauthorVaglio Pret, Alessandro
dc.contributor.imecauthorErcken, Monique
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage90520Z
dc.source.conferenceOptical Microlithography XXVII
dc.source.conferencedate23/02/2014
dc.source.conferencelocationSan Jose, CA USA
dc.identifier.urlhttp://proceedings.spiedigitallibrary.org/proceeding.aspx?articleid=1857393
imec.availabilityPublished - open access
imec.internalnotesProceedings of SPIE; Vol. 9052


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